ION SOURCE DEVICE

PURPOSE:To obtain an ion source device wherein electrons and gas to be ionized are smoothly guided to an ionization chamber to generate a uniform ion beam with high efficiency by shaping a diffusion plate so that the upstream (hollow cathode side) of a rotary ellipsoid and a cone is raised. CONSTITUTION:In case a diffusion plate is shaped so as to be raised on the upstream side, the ratio between a solid angle of a wall of an ionization chamber 4 whereon the diffusion plate 5' faces and the solid angle of a gas leading-in hole 11 becomes extremely big as compared with the case wherein the diffusion plate 5' is a flat plate. As a result, while in the former devices the electrons or gas particles, which are injected and rushed to the diffusion plate, and mostly rearward scattered to flow backward through the lead-in holes, in the present invention the electrons or gas particles are likely to be caught by the ionization chamber 4.

申请(专利)号: JP19810199656
申请日期: 1981年12月9日
公开(公告)日: 1983年6月15日
公开(公告)号: JPS58100334(A)
主分类号: H01J37/08,H,H01,H01J,H01J37
分类号: H01J37/08,F03H1/00,H01J3/04,H01J27/20,H05H7/08,H,F,H01,F03,H05,H01J,F03H,H05H,H01J37,F03H1,H01J3,H01J27,H05H7
申请(专利权)人: MITSUBISHI DENKI KK
发明(设计)人: YOSHIKAWA KANZOU,TAMURA MASAKAZU